Giudice M D, Bruno F, Cicinelli T, Valli M
Appl Opt. 1990 Aug 20;29(24):3489-96. doi: 10.1364/AO.29.003489.
Planar optical waveguides on thermally oxidized Si(111) substrates have been made with rf magnetron sputtering deposition from a SiO(2) target in a N(2) and Ar reactive atmosphere. Reproducible guiding layers of silicon oxynitride with refractive index in the 1.6-1.9 range have been obtained changing deposition parameters. A detailed study of the film characteristics in terms of optical and chemical properties is reported. The films are a mixture of SiO(2) and silicon oxynitride, with an extended intermixed region at the thermal SiO(2) buffer layer interface. Further annealing in N(2) atmosphere (600 degrees C < T < 1000 degrees C) resulted in waveguide attenuation values lower than 1 dB/cm for lambda = 0.633 microm.
通过在氮气和氩气反应气氛中利用射频磁控溅射从二氧化硅靶材沉积，在热氧化的硅（111）衬底上制备了平面光波导。通过改变沉积参数，获得了折射率在1.6 - 1.9范围内的可重复的氮氧化硅引导层。报告了对薄膜光学和化学性质方面特性的详细研究。这些薄膜是二氧化硅和氮氧化硅的混合物，在热生长的二氧化硅缓冲层界面处有一个扩展的混合区域。在氮气气氛中进一步退火（600℃ < T < 1000℃），对于波长λ = 0.633微米，导致波导衰减值低于1 dB/cm。
