Heitmann W
Appl Opt. 1973 Feb 1;12(2):394-7. doi: 10.1364/AO.12.000394.
Sc(2)O(3) and Y(2)O(3) films were prepared by evaporation from resistance heated boats in a residual gas atmosphere of oxygen. Films of much lower absorptance were obtained than from coatings produced in high vacuum. The short wavelength limit of high transparency was between 300 nm and 400 nm, while the long wavelength absorption edge was reached at about 11 microm. Refractive indices of 1.8-2.0 were measured for both oxides. The influence of annealing on the optical- properties of the films was investigated. The films were amorphous and proved to be mechanically very stable and water resistant. Electron micrographs showed smooth and uniform surfaces. By antireflection coatings of yttria the transmittance of silicon was increased from 52% to 99.4% at the maximum. Possible advantages by the application of Sc(2)O(3) and Y(2)O(3) instead of SiO for antireflection coatings on GaAs laser surfaces are discussed.
通过在氧气残余气体气氛中从电阻加热舟蒸发制备了Sc₂O₃和Y₂O₃薄膜。与在高真空中制备的涂层相比，获得的薄膜吸收率要低得多。高透明度的短波长极限在300纳米至400纳米之间，而长波长吸收边在约11微米处达到。两种氧化物的折射率测量值为1.8 - 2.0。研究了退火对薄膜光学性能的影响。这些薄膜是非晶态的，并且证明在机械上非常稳定且防水。电子显微镜照片显示表面光滑且均匀。通过氧化钇抗反射涂层，硅的透过率最高从52%提高到了99.4%。讨论了在GaAs激光表面应用Sc₂O₃和Y₂O₃代替SiO作为抗反射涂层可能具有的优势。
