Daneu V, Sanchez A
Appl Opt. 1974 Jan 1;13(1):122-8. doi: 10.1364/AO.13.000122.
A new method is described for the determination of refractive index of transparent films on transparent substrates based on the observation of an interference pattern in the light scattered by the film. The pattern consists of a series of bright rings caused by multiple reflections inside the film; when the film index is lower than the substrate index, a measurement of the diameters of two rings uniquely determines both film index and thickness. Accuracies of 1 part in 10(3) for the refractive index and 1 part in 10(2) for the thickness are obtained. Examples of application to films of several thermally evaporated materials are given.
本文描述了一种基于观察薄膜散射光中的干涉图样来测定透明衬底上透明薄膜折射率的新方法。该图样由薄膜内部多次反射产生的一系列亮环组成；当薄膜折射率低于衬底折射率时，测量两个环的直径就能唯一确定薄膜的折射率和厚度。折射率的测量精度可达10⁻³，厚度的测量精度可达10⁻²。文中给出了该方法应用于几种热蒸发材料薄膜的示例。
