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用于测量近透明薄膜折射率和厚度的斐索干涉测量法。

Fizeau interferometry for measuring refractive index and thickness of nearly transparent films.

作者信息

Buckman A B, Kuo C

出版信息

Appl Opt. 1978 Nov 15;17(22):3636-40. doi: 10.1364/AO.17.003636.

Abstract

A simple method for measuring refractive index and thickness of nearly transparent films from Fizeau interferograms is described. The method requires no polarizing optics, variation of wavelength or angle of incidence, or precise light intensity comparisons. Commercially available Fizeau surface relief measuring instruments can be used without modification, the only necessary change being a partial, rather than complete, metallization of the sample surface. Analysis of the contributions of different sources of error to the over-all error in the refractive-index measurement indicates that the measurement is quite insensitive to weak absorption in the dielectric film and to finite absorption in the metal layer. For typical values of index and thickness, the thickness error is about 0.005 wavelengths, and the refractive-index error is of the order 0.01.

摘要

描述了一种从菲佐干涉图测量近透明薄膜折射率和厚度的简单方法。该方法不需要偏振光学器件、波长或入射角的变化,也不需要精确的光强比较。市售的菲佐表面形貌测量仪器无需改装即可使用,唯一必要的改变是对样品表面进行部分而非完全金属化处理。对折射率测量中不同误差源对总误差的贡献进行分析表明,该测量对介电薄膜中的弱吸收和金属层中的有限吸收相当不敏感。对于典型的折射率和厚度值,厚度误差约为0.005个波长,折射率误差约为0.01。

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