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光保护:当前和未来技术的综述。

Photoprotection: a review of the current and future technologies.

机构信息

Memorial Sloan-Kettering Cancer Center, New York, New York, USA.

出版信息

Dermatol Ther. 2010 Jan-Feb;23(1):31-47. doi: 10.1111/j.1529-8019.2009.01289.x.

Abstract

Exposure to ultraviolet (UV) radiation is associated with a variety of harmful effects ranging from photoaging to skin cancer. UVB (290 to 320 nm) directly damages the cellular DNA leading to the formation of the 6-4 cyclobutane pyrimidine dimmers, and UVA (320 to 400 nm) indirectly damages the DNA via the production of oxygen radical species. In this review, we focused on the technological and scientific aspects of photoprotection using sunglasses and clothing while attempting to dispel some of the misconceptions. In addition to the basic knowledge relating to sunscreens, we reviewed the current guidelines for testing and labeling UVA protection around the world, controversies associated with nanoparticles, and future sunscreens actives waiting for the Food and Drug Administration approval. Lastly, we reviewed alternative agents, such as antioxidants, that can be used to supplement and augment photoprotection provided by sunscreens.

摘要

暴露于紫外线(UV)辐射会引起多种有害影响,从光老化到皮肤癌不等。UVB(290 至 320nm)直接破坏细胞 DNA,导致 6-4 环丁烷嘧啶二聚体的形成,而 UVA(320 至 400nm)则通过产生氧自由基间接破坏 DNA。在这篇综述中,我们专注于使用太阳镜和衣物进行光保护的技术和科学方面,同时试图消除一些误解。除了与防晒霜相关的基础知识外,我们还回顾了世界各地测试和标记 UVA 保护的现行指南、与纳米颗粒相关的争议,以及等待食品和药物管理局批准的未来防晒霜活性成分。最后,我们回顾了一些替代剂,如抗氧化剂,它们可用于补充和增强防晒霜提供的光保护。

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