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本文引用的文献

1
Effects of Tailored Dispersity on the Self-Assembly of Dimethylsiloxane-Methyl Methacrylate Block Co-Oligomers.
ACS Macro Lett. 2017 Jul 18;6(7):668-673. doi: 10.1021/acsmacrolett.7b00262. Epub 2017 Jun 13.
2
High χ-Low Block Polymers: How Far Can We Go?
ACS Macro Lett. 2015 Sep 15;4(9):1044-1050. doi: 10.1021/acsmacrolett.5b00472. Epub 2015 Sep 2.
4
Fluctuation effects on the order-disorder transition in polydisperse copolymer melts.
J Chem Phys. 2013 Dec 7;139(21):214905. doi: 10.1063/1.4833137.
5
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.
ACS Nano. 2012 Apr 24;6(4):3424-33. doi: 10.1021/nn300459r. Epub 2012 Apr 12.
6
Unexpected consequences of block polydispersity on the self-assembly of ABA triblock copolymers.
J Am Chem Soc. 2012 Feb 29;134(8):3834-44. doi: 10.1021/ja210548e. Epub 2012 Feb 16.
7
A path to ultranarrow patterns using self-assembled lithography.
Nano Lett. 2010 Mar 10;10(3):1000-5. doi: 10.1021/nl904141r.
8
Poly(lactide) stereocomplexes: formation, structure, properties, degradation, and applications.
Macromol Biosci. 2005 Jul 14;5(7):569-97. doi: 10.1002/mabi.200500062.

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