Hu Juejun, Feng Ning-Ning, Carlie Nathan, Petit Laeticia, Agarwal Anu, Richardson Kathleen, Kimerling Lionel
Microphotonics Center, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
Opt Express. 2010 Jan 18;18(2):1469-78. doi: 10.1364/OE.18.001469.
A thermal reflow technique is applied to high-index-contrast, sub-micron waveguides in As(2)S(3) chalcogenide glass to reduce the sidewall roughness and associated optical scattering loss. We show that the reflow process effectively decreases sidewall roughness of chalcogenide glass waveguides. A kinetic model is presented to quantitatively explain the sidewall roughness evolution during thermal reflow. Further, we develop a technique to calculate waveguide optical loss using the roughness evolution model, and predict the ultimate low loss limit in reflowed high-index-contrast glass waveguides. Up to 50% optical loss reduction after reflow treatment is experimentally observed, and the practical loss limiting factors are discussed.
一种热回流技术应用于砷化镓硫系玻璃中高折射率对比度的亚微米波导,以降低侧壁粗糙度和相关的光散射损耗。我们表明,回流过程有效地降低了硫系玻璃波导的侧壁粗糙度。提出了一个动力学模型来定量解释热回流过程中侧壁粗糙度的演变。此外,我们开发了一种利用粗糙度演变模型计算波导光损耗的技术,并预测了回流后的高折射率对比度玻璃波导的最终低损耗极限。实验观察到回流处理后光损耗降低了50%,并讨论了实际的损耗限制因素。