Policom-DEI, Politecnico di Milano, Via Colombo 81, 20133 Milano, Italy.
Phys Rev Lett. 2010 Jan 22;104(3):033902. doi: 10.1103/PhysRevLett.104.033902. Epub 2010 Jan 20.
We report on the direct observation of backscattering induced by sidewall roughness in high-index-contrast optical waveguides based on total internal reflection. Our results demonstrate that backscattering is one of the most severe limiting factors in state-of-the art silicon on insulator nanowires employed in densely integrated photonics. We also derive the general relationship between backscattering and geometrical and optical parameters of the waveguide. Further, the role of roughness in polarization rotation and coupling with higher-order modes is pointed out.
我们报告了基于全内反射的高光折射率对比光学波导中侧壁粗糙度引起的背向散射的直接观察。我们的结果表明,背向散射是当今最先进的硅绝缘体纳米线在密集集成光子学中应用的最严重的限制因素之一。我们还推导出了背向散射与波导的几何和光学参数之间的一般关系。此外,还指出了粗糙度在偏振旋转和与高阶模式耦合中的作用。