Beijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100191, China.
J Phys Chem B. 2010 Apr 29;114(16):5315-9. doi: 10.1021/jp100928d.
A novel covalence-linked PMMA-SiO(2) hybrid nanodielectrics was prepared by grafting approximately 10 nm PMMA brush onto the SiO(2) (approximately 9 nm) surface, which effectively combines the respective merits of PMMA and SiO(2). As a result, the hybrid nanodielectrics exhibit excellent dielectric performance (e.g., low leakage density (<10(-7) A/cm(2) at 6 MV/cm), high breakdown voltage (7 MV/cm), high capacitance (142 nF/cm(2)), good operational stability, and good compatibility with organic semiconductors), and enable organic field-effect transistors (OFETs) to work with high performance and low voltage. These results may open a way to build ultrathin dielectrics for high performance transistor and circuit, as well as for microelectronics, nanoelectronics, and organic electronics.
一种新型的共价键联 PMMA-SiO2 杂化纳米电介质是通过将大约 10nm 的 PMMA 刷接枝到 SiO2(大约 9nm)表面上制备的,这有效地结合了 PMMA 和 SiO2 的各自优点。结果,杂化纳米电介质表现出优异的介电性能(例如,低泄漏密度(在 6MV/cm 时小于 10-7A/cm2)、高击穿电压(7MV/cm)、高电容(142nF/cm2))、良好的工作稳定性,以及与有机半导体的良好兼容性,使有机场效应晶体管(OFETs)能够以高性能和低电压工作。这些结果可能为高性能晶体管和电路以及微电子学、纳米电子学和有机电子学开辟了构建超薄电介质的途径。