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在双束显微镜中制备的 PdC 和 WC 纳米线的输运性质和生长参数。

Transport properties and growth parameters of PdC and WC nanowires prepared in a dual-beam microscope.

机构信息

Abteilung für Supraleitung und Magnetismus, Institut für Experimentelle Physik II, Universität Leipzig, Linnéstrasse 5, D-04103 Leipzig, Germany.

出版信息

Nanotechnology. 2007 Dec 12;18(49):495202. doi: 10.1088/0957-4484/18/49/495202. Epub 2007 Nov 15.

Abstract

In this work we investigate the electrical transport properties and growth conditions of tungsten carbon (WC) and palladium carbon (PdC) nanostructures on Si substrates using a focused ion beam and scanning electron microscope. In situ energy dispersive x-ray (EDX) characterizations reveal that electron-beam-induced WC and PdC nanostructure depositions (EBID) show a lower metal concentration (below 3% atomic percentage) than in ion-beam-induced deposition (IBID) (above 20%). In the case of PdC the growth pattern and the Pd/C content were optimized by adjusting the deposition temperature of the precursor material. In situ measurements of the resistivity of the nanostructures as a function of thickness reveal a minimum at a thickness approximately 200 nm. The lowest resistivity obtained for the PdC and WC structures is two orders of magnitude higher than the corresponding bulk values for pure Pd and W. The EBID samples show a non-metallic behaviour due to the low metal content. The temperature and magnetic field dependence of the IBID structures reveal a behaviour similar to disordered or granular conductors. The upper critical field and critical current density of the WC structures were measured below the superconducting critical temperature of approximately 5 K.

摘要

在这项工作中,我们使用聚焦离子束和扫描电子显微镜研究了硅衬底上钨碳(WC)和钯碳(PdC)纳米结构的电输运特性和生长条件。原位能谱(EDX)分析表明,电子束诱导 WC 和 PdC 纳米结构沉积(EBID)的金属浓度(低于 3%原子百分比)低于离子束诱导沉积(IBID)(高于 20%)。在 PdC 的情况下,通过调整前体材料的沉积温度优化了生长模式和 Pd/C 含量。作为厚度函数的纳米结构电阻率的原位测量表明,在厚度约为 200nm 时出现最小值。对于 PdC 和 WC 结构,获得的最低电阻率比纯 Pd 和 W 的相应体值高两个数量级。由于金属含量低,EBID 样品表现出非金属行为。IBID 结构的温度和磁场依赖性显示出类似于无序或颗粒状导体的行为。在约 5K 的超导临界温度以下测量了 WC 结构的上临界场和临界电流密度。

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