Department of Electrical Engineering, Korea University, 5-1 Anam-dong, Seongbuk-gu, Seoul 136-701, Republic of Korea.
Nanotechnology. 2010 Aug 20;21(33):335201. doi: 10.1088/0957-4484/21/33/335201. Epub 2010 Jul 26.
We construct fully transparent nano-floating gate memory devices on a glass substrate. These memory thin-film transistors consist of channel layers of ZnO films, electrodes of Al/ITO, and floating gate nodes of Al nanoparticles, exhibiting a transmittance of approximately 71% in the visible region. Their electron mobility, on/off ratio, and threshold voltage shift are estimated to be 0.92 cm(2) V( - 1) s( - 1), about 10(4), and 3.1 V, respectively. Moreover, their programming/erasing, endurance and retention are characterized in this study. Our study suggests that our memory devices have great potential for realizing transparent systems-on-glass.
我们在玻璃衬底上构建了完全透明的纳米浮栅存储器件。这些存储薄膜晶体管的沟道层由 ZnO 薄膜组成,电极由 Al/ITO 组成,浮栅节点由 Al 纳米粒子组成,在可见光区的透光率约为 71%。它们的电子迁移率、开关比和阈值电压漂移分别估计为 0.92cm^2V^-1s^-1、约 10^4 和 3.1V。此外,本研究还对它们的编程/擦除、耐久性和保持性进行了表征。我们的研究表明,我们的存储器件在实现透明玻璃上系统方面具有巨大的潜力。