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用于光伏应用的纳米孔纹理硅薄膜中的光学吸收增强。

Optical absorption enhancement in nanopore textured-silicon thin film for photovoltaic application.

机构信息

School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798.

出版信息

Opt Lett. 2010 Jan 1;35(1):40-2. doi: 10.1364/OL.35.000040.

Abstract

Silicon thin film with a nanopore textured surface is systematically studied via simulation for photovoltaic application, where the optical characteristics are closely correlated with the nanopore structural parameters. It is found that the solar energy absorption could be optimized when the nanopore array structure dimensions are set as follows: periodicity of 700 nm, depth of 2000 nm, and pore diameter versus periodicity ratio of 87.5%. The result provides an additional guideline for the nanostructure surface texturing-process design for photovoltaic applications.

摘要

硅薄膜的纳米孔纹理表面经过系统的模拟研究,用于光伏应用,其光学特性与纳米孔结构参数密切相关。研究发现,当纳米孔阵列结构尺寸设置为周期为 700nm、深度为 2000nm、孔径与周期比为 87.5%时,太阳能吸收可以得到优化。该结果为光伏应用的纳米结构表面织构工艺设计提供了额外的指导。

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