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E-beam lithography for micro-nanofabrication.
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3D Nanoprinting by Electron-Beam with an Ice Resist.
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Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale.
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Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.
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Ice lithography for 3D nanofabrication.
Sci Bull (Beijing). 2019 Jun 30;64(12):865-871. doi: 10.1016/j.scib.2019.06.001. Epub 2019 Jun 3.
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Lithography Technology for Micro- and Nanofabrication.
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