电子束光刻技术在微纳制造中的应用。
E-beam lithography for micro-nanofabrication.
机构信息
Melbourne Centre for Nanofabrication, 151 Wellington Rd., Clayton, Victoria 3168, Australia.
出版信息
Biomicrofluidics. 2010 Jun 15;4(2):026503. doi: 10.1063/1.3437589.
Abstract
Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.
摘要
电子束光刻（EBL）是在各种材料上书写微纳结构的首选工具之一。这在很大程度上是因为现代 EBL 机能在毫米（2）级别的区域上书写纳米级结构。本贡献的目的是为这种极其灵活的纳米制造技术提供技术和实践背景。
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