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原子六方氮化硼层的大规模生长和特性研究。

Large scale growth and characterization of atomic hexagonal boron nitride layers.

机构信息

Department of Mechanical Engineering & Materials Science, Rice University, Houston, Texas 77005, USA.

出版信息

Nano Lett. 2010 Aug 11;10(8):3209-15. doi: 10.1021/nl1022139.

DOI:10.1021/nl1022139
PMID:20698639
Abstract

Hexagonal boron nitride (h-BN), a layered material similar to graphite, is a promising dielectric. Monolayer h-BN, so-called "white graphene", has been isolated from bulk BN and could be useful as a complementary two-dimensional dielectric substrate for graphene electronics. Here we report the large area synthesis of h-BN films consisting of two to five atomic layers, using chemical vapor deposition. These atomic films show a large optical energy band gap of 5.5 eV and are highly transparent over a broad wavelength range. The mechanical properties of the h-BN films, measured by nanoindentation, show 2D elastic modulus in the range of 200-500 N/m, which is corroborated by corresponding theoretical calculations.

摘要

六方氮化硼(h-BN)是一种类似于石墨的层状材料,是一种很有前途的介电材料。单层 h-BN,即所谓的“白石墨烯”,已经从块状 BN 中分离出来,可用作石墨烯电子学的二维介电衬底。在这里,我们报告了使用化学气相沉积法大面积合成由两到五个原子层组成的 h-BN 薄膜。这些原子薄膜表现出 5.5 eV 的大光学能隙,并且在很宽的波长范围内具有高透明性。通过纳米压痕法测量的 h-BN 薄膜的机械性能表明,2D 弹性模量在 200-500 N/m 范围内,这与相应的理论计算相符。

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