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用于实现短波长(68埃)软X射线成像光学器件所需的多层周期变化的掩膜沉积技术。

Masked deposition techniques for achieving multilayer period variations required for short-wavelength (68-A) soft-x-ray imaging optics.

作者信息

Kortright J B, Gullikson E M, Denham P E

出版信息

Appl Opt. 1993 Dec 1;32(34):6961-8. doi: 10.1364/AO.32.006961.

Abstract

Practical issues in the development of multilayer coatings for reflective imaging systems operating at λ ≈ 68 Å are discussed. The 1% bandpass of Ru/B(4) C multilayers at this short wavelength imposes stringent tolerances with which the actual multilayer period variation across the curved surfaces must match the ideal period variation for a 20× demagnifying Schwarzschild objective. New deposition techniques that use masks to correct the period variation across the curved surfaces of each optic have been developed to ensure reflectance over the entire clear aperture. The narrow bandpass together with steep lateralperiod gradients and steeply curved surfaces requires improved metrology for an acceptable period variation to be obtained and the overlap of the reflectance peaks on the two mirrors to be verified.

摘要

讨论了用于在λ≈68 Å波长下工作的反射成像系统的多层涂层开发中的实际问题。在这个短波长下,Ru/B(4)C多层膜的1%带通要求非常严格,即曲面上实际的多层周期变化必须与20倍缩小的施瓦兹schild物镜的理想周期变化相匹配。已经开发出了新的沉积技术,使用掩膜来校正每个光学元件曲面上的周期变化,以确保在整个清晰孔径上的反射率。窄带通以及陡峭的横向周期梯度和陡峭的曲面需要改进计量学,以获得可接受的周期变化,并验证两个镜面上反射峰的重叠情况。

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