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用于碳Kα辐射的施瓦西显微镜。

Schwarzschild microscope for carbon Kα radiation.

作者信息

Murakami K, Oshino T, Nakamura H, Ohtani M, Nagata H

出版信息

Appl Opt. 1993 Dec 1;32(34):7057-61. doi: 10.1364/AO.32.007057.

Abstract

A Schwarzschild objective (magnification, ×32; numerical aperture, 0.2), which has a 0.1-µm resolution within 30 µm of the object height, was designed and fabricated. We have developed new normalincidence multilayer mirrors for carbon Kα radiation (wavelength, 44.8 Å), NiCr (80-20 wt. %)/C multilayers (thickness period, 22.5 Å; number of layers, 50), which are deposited by ion-beam sputtering with the thickness distribution corrected by deposition masks. Magnified images were taken on photographic film with the Schwarzschild objective by using an electron impact carbon Kα radiation source, and a resolution of < 0.5 µm was confirmed.

摘要

设计并制造了一个施瓦兹希尔德物镜(放大倍数为32倍;数值孔径为0.2),该物镜在物体高度30微米范围内具有0.1微米的分辨率。我们开发了用于碳Kα辐射(波长为44.8埃)的新型正入射多层镜,即NiCr(80 - 20重量百分比)/C多层膜(厚度周期为22.5埃;层数为50),通过离子束溅射沉积,并利用沉积掩膜校正厚度分布。使用电子碰撞碳Kα辐射源,通过施瓦兹希尔德物镜在摄影胶片上拍摄放大图像,确认分辨率小于0.5微米。

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