Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208-3113, United States.
Nano Lett. 2010 Nov 10;10(11):4399-404. doi: 10.1021/nl101942s.
Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼ 100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.
聚乙二醇（PEG）聚合物透镜阵列是通过使用蘸笔纳米光刻在疏水改性的石英玻璃上沉积纳米级 PEG 特征来制造的。通过调整停留时间和聚合物分子量来控制 PEG 透镜的尺寸。石英基底上的 PEG 聚合物透镜充当相移光掩模，用于制造亚波长尺度的特征结构，宽度约为 100nm。根据光刻过程中的 UV 照射时间，光刻胶纳米结构可以从形状良好的（短时间）转变为环形的（长时间）特征。该技术可以通过使用悬臂阵列来对大面积进行图案化。
