Okada H, Mayama K, Goto Y, Kusunoki I, Yanagihara M
Appl Opt. 1994 Jul 1;33(19):4219-24. doi: 10.1364/AO.33.004219.
We prepared eight samples of Mo/X and W/X (X = BN:O, B(4)C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B(4)C layers showed the concentration of O to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 °C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 °C.
我们通过磁控溅射制备了八个Mo/X和W/X（X = BN:O、B(4)C:O、Si和C）多层膜样品。对氮化硼和B(4)C层的X射线光电子能谱分析表明，氧的浓度不可忽略。我们通过测量在高达700°C的温度下进行热退火前后的软X射线镜面反射率来评估热稳定性。结果表明，热稳定性在很大程度上取决于低密度材料的包含情况，而不是金属的类型。在所研究的四种低密度材料中，BN:O在热稳定性方面表现最佳，八个样品中最稳定的Mo/BN:O多层膜在700°C时仍具有稳定性。
