Department of Process and Mechanical Engineering, Institute of Process Engineering, ETH Zurich, Zurich, Switzerland.
Nanotechnology. 2010 Nov 19;21(46):465604. doi: 10.1088/0957-4484/21/46/465604. Epub 2010 Oct 25.
Silica nanowire arrays were grown directly onto plain glass substrates by scalable flame spray pyrolysis of organometallic solutions (hexamethyldisiloxane or tetraethyl orthosilicate). The silicon dioxide films consisted of a network of interwoven nanowires from a few to several hundred nanometres long (depending on the process conditions) and about 20 nm in diameter, as determined by scanning electron microscopy. These films were formed rapidly (within 10-20 s) at high growth rates (ca 11-30 nm s(-1)) by chemical vapour deposition (surface growth) at ambient conditions on the glass substrate as determined by thermophoretic sampling of the flame aerosol and microscopy. In contrast, on high purity quartz nearly no nanowires were grown while on steel substrates porous SiO(2) films were formed. Functionalization with perfluorooctyl triethoxysilane converted the nanowire surface from super-hydrophilic to hydrophobic. Additionally, their hermetic coating by thin carbon layers was demonstrated also revealing their potential as substrates for synthesis of other functional 1D composite structures. This approach is a significant step towards large scale synthesis of SiO(2) nanowires facilitating their utilization in several applications.
采用可扩展的火焰喷雾热解有机金属溶液(六甲基二硅氧烷或正硅酸乙酯),直接在普通玻璃衬底上生长了硅纳米线阵列。通过扫描电子显微镜确定,二氧化硅薄膜由几到几百纳米长(取决于工艺条件)、直径约 20nm 的相互交织的纳米线网络组成。这些薄膜通过在环境条件下的化学气相沉积(表面生长)快速形成(在 10-20 秒内),在玻璃衬底上的生长速率较高(约为 11-30nm/s),这是通过火焰气溶胶的热泳采样和显微镜确定的。相比之下,在高纯石英上几乎没有生长纳米线,而在钢衬底上则形成了多孔的 SiO2 薄膜。用全氟辛基三乙氧基硅烷进行功能化,将纳米线表面从超亲水变为疏水。此外,还通过薄的碳层对其进行了密封涂层,这也显示了它们作为合成其他功能 1D 复合结构的基底的潜力。这种方法是大规模合成 SiO2 纳米线的重要一步,有利于它们在多个应用中的应用。