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用于原位表征薄膜力学响应的同步辐射双轴拉伸装置的开发。

Development of a synchrotron biaxial tensile device for in situ characterization of thin films mechanical response.

作者信息

Geandier G, Thiaudière D, Randriamazaoro R N, Chiron R, Djaziri S, Lamongie B, Diot Y, Le Bourhis E, Renault P O, Goudeau P, Bouaffad A, Castelnau O, Faurie D, Hild F

机构信息

Département PMM, Institut Pprime, UPR 3346 CNRS, Université de Poitiers-ENSMA, SP2MI, Teleport 2, Boulevard Marie et Pierre Curie, BP 30179-86962 Futuroscope Chasseneuil Cedex, France.

出版信息

Rev Sci Instrum. 2010 Oct;81(10):103903. doi: 10.1063/1.3488628.

Abstract

We have developed on the DIFFABS-SOLEIL beamline a biaxial tensile machine working in the synchrotron environment for in situ diffraction characterization of thin polycrystalline films mechanical response. The machine has been designed to test compliant substrates coated by the studied films under controlled, applied strain field. Technological challenges comprise the sample design including fixation of the substrate ends, the related generation of a uniform strain field in the studied (central) volume, and the operations from the beamline pilot. Preliminary tests on 150 nm thick W films deposited onto polyimide cruciform substrates are presented. The obtained results for applied strains using x-ray diffraction and digital image correlation methods clearly show the full potentialities of this new setup.

摘要

我们在DIFFABS-SOLEIL光束线上开发了一种双轴拉伸机,该拉伸机在同步加速器环境中工作,用于对薄多晶薄膜的力学响应进行原位衍射表征。该机器旨在在受控的外加应变场下测试涂覆有所研究薄膜的柔性基板。技术挑战包括样品设计,其中包括基板端部的固定、在所研究的(中心)体积中产生均匀应变场以及来自光束线控制端的操作。本文展示了在聚酰亚胺十字形基板上沉积的150纳米厚钨薄膜的初步测试结果。使用X射线衍射和数字图像相关方法获得的外加应变结果清楚地显示了这种新装置的全部潜力。

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