García Molleja J, Bürgi J, Kellermann G, Craievich A, Neuenschwander R, Jouan P-Y, Djouadi M A, Piccoli M, Bemporad E, De Felicis D, Feugeas J N
Instituto de Física Rosario (Conicet-UNR) , Bv. 27 de Febrero 210 bis , S2000EZP Rosario , Argentina.
IMDEA Materials Institute , C/Eric Kandel 2, Parque Científico y Tecnológico de Tecnogetafe , 28906 Getafe , Spain.
J Phys Chem B. 2019 Feb 21;123(7):1679-1687. doi: 10.1021/acs.jpcb.8b09496. Epub 2019 Feb 8.
This article reports the design, construction, and first use of an experimental device consisting of a specially designed vacuum chamber equipped with a reactive sputtering magnetron (RSM) to be used for controlled deposition of thin films on a Si(100) flat substrate. The setup was designed to allow for in situ and real-time recordings of X-ray diffraction patterns during the growth of the deposited films and was installed in the X-ray diffraction and spectroscopy beamline emerging from a superconducting wiggler source at the Brazilian Synchrotron Light Laboratory. The first use of the RSM setup was an in situ and real-time X-ray diffraction study of processes of growth of multilayered aluminum nitride thin films, whereas the operation parameters of the reactor were sequentially changed. This sequential process led to the development of multilayered films. Alternate variations in chamber pressure and magnetron power density allowed us to obtain thin films composed of several micrometer thick layers, with alternate amorphous and (10·0), (00·2), or (10·1) textured polycrystalline structures.
本文报道了一种实验装置的设计、构建及首次使用情况。该装置由一个专门设计的真空腔组成，配备有反应溅射磁控管（RSM），用于在Si(100)平面衬底上进行薄膜的可控沉积。该装置的设计目的是在沉积薄膜生长过程中实现X射线衍射图案的原位实时记录，并安装在巴西同步加速器光源实验室的超导摆动器源产生的X射线衍射和光谱光束线上。RSM装置的首次使用是对多层氮化铝薄膜生长过程进行原位实时X射线衍射研究，在此过程中依次改变了反应器的操作参数。这个顺序过程导致了多层薄膜的形成。通过交替改变腔室压力和磁控管功率密度，我们获得了由几微米厚的层组成的薄膜，这些层具有交替的非晶态和（10·0）、（00·2）或（10·1）织构的多晶结构。
