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Electron beam characteristics on a Philips SL25.

作者信息

Palta J R, Daftari I K, Ayyangar K M, Suntharalingam N

机构信息

Department of Radiation Oncology, Bodine Center for Cancer Treatment, Thomas Jefferson University Hospital, Philadelphia, Pennsylvania 19107.

出版信息

Med Phys. 1990 Jan-Feb;17(1):27-34. doi: 10.1118/1.596524.

DOI:10.1118/1.596524
PMID:2106612
Abstract

Dosimetry measurements at nominal electron energies of 4, 6, 8, 10, 12, 15, 17, 20, and 22 MeV were made for different sized, open-sided applicators on two Philips SL25 linear accelerators. Measurements include beam flatness, percentage depth dose, surface dose, isodose curves, field size dependence, output at extended distances, virtual source position, and required low melting point alloy thickness for field shaping. These measurements are presented to document the characteristics of electron beams with a new type of applicator design on this series of Philips accelerators.

摘要

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