Di Bartolomeo A, Yang Y, Rinzan M B M, Boyd A K, Barbara P
Nanoscale Res Lett. 2010 Aug 14;5(11):1852-1855. doi: 10.1007/s11671-010-9727-6.
We study memory devices consisting of single-walled carbon nanotube transistors with charge storage at the SiO(2)/nanotube interface. We show that this type of memory device is robust, withstanding over 10(5) operating cycles, with a current drive capability up to 10(-6) A at 20 mV drain bias, thus competing with state-of-the-art Si-devices. We find that the device performance depends on temperature and pressure, while both endurance and data retention are improved in vacuum.
我们研究了由单壁碳纳米管晶体管组成的存储器件,其电荷存储在SiO(2)/纳米管界面处。我们表明,这种类型的存储器件性能稳定,能经受超过10(5)个操作循环,在20 mV漏极偏压下电流驱动能力高达10(-6) A,因此可与最先进的硅器件相媲美。我们发现,器件性能取决于温度和压力,而在真空中耐久性和数据保持能力都会得到提高。