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用于高速纳米能学的电致渗析多孔硅复合材料。

Galvanic porous silicon composites for high-velocity nanoenergetics.

机构信息

Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, USA.

出版信息

Nano Lett. 2011 Feb 9;11(2):803-7. doi: 10.1021/nl104115u. Epub 2010 Dec 23.

Abstract

Porous silicon (PS) films ∼65-95 μm thick composed of pores with diameters less than 3 nm were fabricated using a galvanic etching approach that does not require an external power supply. A highly reactive, nanoenergetic composite was then created by impregnating the nanoscale pores with the strong oxidizer, sodium perchlorate (NaClO(4)). The combustion propagation velocity of the energetic composite was measured using microfabricated diagnostic devices in conjunction with high-speed optical imaging up to 930000 frames per second. Combustion velocities averaging 3050 m/s were observed for PS films with specific surface areas of ∼840 m(2)/g and porosities of 65-67%.

摘要

采用无需外部电源的电致化学刻蚀方法制备了厚度约为 65-95μm 的多孔硅(PS)薄膜,这些 PS 薄膜由直径小于 3nm 的孔组成。随后,通过将强氧化剂高氯酸钠(NaClO(4))浸渍到纳米级孔中,制备了一种高反应性的纳米含能复合材料。利用微制造诊断装置并结合高速光学成像,测量了含能复合材料的燃烧传播速度,最高可达每秒 930000 帧。对于比表面积约为 840m(2)/g、孔隙率为 65-67%的 PS 薄膜,观察到的燃烧速度平均为 3050m/s。

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