钴离子增强甲芬那酸的抗真菌作用。
Elevation of antidermatophytic action of mefenamic acid by cobalt ions.
机构信息
Department of Clinical Laboratory, College of Applicable of Medical Sciences, University of Karbala, Karbala, Iran.
出版信息
Indian J Pharmacol. 2010 Dec;42(6):351-3. doi: 10.4103/0253-7613.71907.
OBJECTIVES
To evaluate the antifungal property of mefenamic acid, which is a member of non-steroidal anti-inflammatory drugs (NSAIDs) group.
MATERIALS AND METHODS
In order to evaluate the antifungal property of mefenamic acid on dermatophytes, it was mixed with cobalt (Co) in culture media. Two species related to two genera of dermatophytes were tested for their susceptibility to mefenamic acid and its complex with Co by using colony diameter measurement method.
RESULTS
The inhibitory action of mefenamic acid on fungal strains was increased in the presence of Co. Epidermophyton floccosum showed more susceptibly to either mefenamic acid or its complex with Co than Trichophyton mentagrophytes variant mentagrophytes.
CONCLUSIONS
Mefenamic acid showed potential ability to prevent growth of dermatophytes. This ability increased due to the presence of Co.
目的
评估甲芬那酸（一种非甾体抗炎药 [NSAIDs] 类药物）的抗真菌特性。
材料与方法
为了评估甲芬那酸对皮肤真菌的抗真菌特性，将其与钴（Co）混合在培养基中。使用菌落直径测量法，测试两种与两种皮肤真菌属相关的物种对甲芬那酸及其与 Co 复合物的敏感性。
结果
在 Co 的存在下，甲芬那酸对真菌株的抑制作用增强。糠秕马拉色菌比须癣毛癣菌更易受甲芬那酸或其与 Co 复合物的影响。
结论
甲芬那酸具有抑制皮肤真菌生长的潜力。由于 Co 的存在，这种能力有所增强。
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