Department of Chemistry, University of Virginia, Charlottesville, Virginia 22904, USA.
J Chem Phys. 2011 Feb 14;134(6):064315. doi: 10.1063/1.3532089.
As a model for silicate dust grains in the interstellar medium, we have used high area amorphous SiO(2) as a surface on which to carry out Lyman-α (10.2 eV) photodecomposition of adsorbed N(2)O at 71 K and at a coverage of ∼0.3 monolayer. The N(2)O molecules are adsorbed by hydrogen bonding to surface Si-OH groups. Transmission IR spectroscopy measurements permit the observation of the consumption of adsorbed N(2)O and the production of various photoproducts. It is observed that in comparison to N(2)O consumption, the relative rate of formation of the products NO(2) and N(2)O(4) made by combination reactions is enhanced significantly on the SiO(2) surface. Reactions between photogenerated radicals themselves or between radicals and parent N(2)O on the SiO(2) surface exceed the relative rates observed in the gas phase by factors of up to ∼20. As the complexity of the combination product increases, its relative production rate, compared to the gas phase, increases due to the involvement of multiple surface-combination elementary steps. It is proposed that the enhancement of combination reactions on the SiO(2) surface is due to the surface's ability to absorb excess energy evolved during the chemical-bond-forming events on the surface. This principle is probably significant on grain surfaces supporting photochemical processes of astrochemical interest, and indeed is expected. The cross section for adsorbed N(2)O photodecomposition on the porous SiO(2) surface is about 7 × 10(-20) cm(2) and the quantum yield for the adsorbed molecule decomposition is about 0.006, compared to a quantum yield of 1.46 in the gas phase. This decrease in photon efficiency is attributed to absorption and scattering of Lyman-α radiation by the SiO(2) particles.
我们使用高比表面积非晶态二氧化硅(SiO2)作为模型,研究了星际介质中硅酸盐尘埃颗粒,在 71K 下,通过 Lyman-α(10.2eV)光解吸附在 SiO2 表面的 N2O。N2O 通过氢键吸附在表面 Si-OH 基团上。透射红外光谱测量允许我们观察到吸附的 N2O 的消耗和各种光产物的生成。结果表明,与 N2O 的消耗相比,组合反应生成的产物 NO2 和 N2O4 的相对生成速率在 SiO2 表面上显著增强。光生自由基之间或自由基与 SiO2 表面上的母体 N2O 之间的反应速率比气相中观察到的相对速率高出 20 倍左右。随着组合产物复杂度的增加,其相对生成速率与气相相比增加,这是由于涉及多个表面组合的基本步骤。我们提出,SiO2 表面上组合反应的增强是由于表面吸收了在表面化学成键事件中产生的多余能量。这个原理在支持天体化学感兴趣的光化学过程的颗粒表面上可能很重要,事实上也是如此。在多孔 SiO2 表面上,吸附的 N2O 光解的截面约为 7×10(-20)cm2,吸附分子的量子产率约为 0.006,而在气相中的量子产率为 1.46。光子效率的降低归因于 Lyman-α 辐射被 SiO2 颗粒吸收和散射。