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控制超薄纳米硅膜孔性能的方法。

Methods for controlling the pore properties of ultra-thin nanocrystalline silicon membranes.

机构信息

Department of Electrical and Computer Engineering, University of Rochester, Rochester, NY 14627, USA.

出版信息

J Phys Condens Matter. 2010 Nov 17;22(45):454134. doi: 10.1088/0953-8984/22/45/454134. Epub 2010 Oct 29.

DOI:10.1088/0953-8984/22/45/454134
PMID:21339620
Abstract

Porous nanocrystalline silicon (pnc-Si) membranes are a new class of solid-state ultra-thin membranes with promising applications ranging from biological separations to use as a platform for electron imaging and spectroscopy. Because the thickness of the membrane is only 15-30 nm, on the order of that of the molecules to be separated, mass transport through the membrane is greatly enhanced. For applications involving molecular separations, it is crucial that the membrane is highly permeable to some species while being nearly impermeable to others. An important approach to adjusting the permeability of a membrane is by changing the size and density of the pores. With pnc-Si, a rapid thermal treatment is used to induce nanopore formation in a thin film of nanocrystalline silicon, which is then released over a silicon scaffold using an anisotropic etchant. In this study, we examine the influence of thin film deposition and thermal treatment parameters on pore size and density.

摘要

多孔纳米晶硅(pnc-Si)膜是一类新型固态超薄膜,具有广泛的应用前景,包括生物分离以及作为电子成像和光谱学的平台。由于膜的厚度只有 15-30nm,与待分离的分子相当,因此膜的传质能力大大增强。对于涉及分子分离的应用,膜对某些物质的高透过性而对其他物质的几乎不可透过性至关重要。调整膜透过率的一个重要方法是改变孔径的大小和密度。对于 pnc-Si,可以采用快速热处理技术在纳米晶硅薄膜中诱导形成纳米孔,然后使用各向异性蚀刻剂将其释放到硅支架上。在本研究中,我们考察了薄膜沉积和热处理参数对孔径和密度的影响。

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