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[与用于疟疾预防的多西环素相关的光甲剥离现象]

[Photo-onycholysis observed in connection with doxycycline for malaria prophylaxis].

作者信息

Wolf Hanne Trap, Sørensen Cristel Maria, Larsen Helle Kielberg

机构信息

Dermato-venerologisk Afdeling, Bispebjerg Hospital, Denmark.

出版信息

Ugeskr Laeger. 2011 Feb 28;173(9):661-2.

PMID:21362397
Abstract

We present two cases of phototoxic onycholysis secondary to doxycycline treatment as malaria prophylaxis. Onycholysis is a rare side-effect to treatment with doxycycline and other tetracyclines. Some physicians are unaware of this risk. Due to the increasing travel activity to malaria endemic regions, it is important to be aware of the side effects - including onycholysis - following the use of tetracyclines and it is essential to inform the patients of such effects. Spontaneous recovery follows within a few months after discontinuing the drug and there is no need for further treatment.

摘要

我们报告了两例因使用强力霉素预防疟疾而继发光毒性甲脱离的病例。甲脱离是强力霉素及其他四环素类药物治疗罕见的副作用。一些医生并未意识到这种风险。鉴于前往疟疾流行地区的旅行活动日益增多,了解四环素类药物使用后的副作用(包括甲脱离)非常重要,并且有必要告知患者此类影响。停药后数月内可自发恢复,无需进一步治疗。

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