Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot, Oxfordshire OX11 0DE, UK.
J Phys Condens Matter. 2010 May 5;22(17):175003. doi: 10.1088/0953-8984/22/17/175003. Epub 2010 Mar 29.
By measuring the intensities of the x-ray standing wave induced elastic and inelastic x-ray scattering from thin multilayer structures, we show that structural characterizations of the high and low z (atomic number) material layers can be performed independently. The method has been tested by analyzing the structural properties of an Nb/C/Nb trilayer and an Mo/Si periodic multilayer structure. The results of the x-ray scattering measurements have been compared with those obtained using x-ray reflectivity and conventional x-ray standing wave fluorescence techniques. It has been demonstrated that the present approach is especially suitable for studying multilayer structures comprising low atomic number layers, as it eliminates the requirement of a fluorescence signal, which is very weak in the case of low z materials.
通过测量来自薄多层结构的 x 射线驻波诱导的弹性和非弹性 x 射线散射的强度，我们表明可以独立地进行高 z（原子数）和低 z 材料层的结构表征。该方法已通过分析 Nb/C/Nb 三层和 Mo/Si 周期性多层结构的结构特性进行了测试。x 射线散射测量的结果已与使用 x 射线反射率和常规 x 射线驻波荧光技术获得的结果进行了比较。已经证明，该方法特别适用于研究包含低原子数层的多层结构，因为它消除了对荧光信号的要求，而在低 z 材料的情况下，荧光信号非常微弱。
