Li Li-Sha, Cui Hai-Ning, Jiang Zhen-Yi
Department of Physics, Northwest University, Xi'an 710069, China.
Guang Pu Xue Yu Guang Pu Fen Xi. 2011 Jan;31(1):95-9.
Vanadium oxide films were deposited at different substrate temperatures up to 400 degrees C by DC magnetron sputtering, and through the method of the X-ray diffraction, electron scanning microscopy, infrared and Raman spectra, the present paper studies the structure properties of those films, and through the method of spectrum measuring and fitting, this paper studies the optical properties of the films. At low temperature of preparation the optical films have high optical transmittance. The films prepared at low substrate temperature (lower than 200 degrees C) have amorphous structure and some films prepared at high substrate temperatures (higher than 200 degrees C) have polycrystalline structure. The films' optical parameters were achieved by using classic model to fit the characteristic of transmittance.
通过直流磁控溅射在高达400摄氏度的不同衬底温度下沉积氧化钒薄膜，本文采用X射线衍射、电子扫描显微镜、红外光谱和拉曼光谱等方法研究了这些薄膜的结构特性，并通过光谱测量和拟合方法研究了薄膜的光学特性。在低温制备时，光学薄膜具有高光学透过率。在低衬底温度（低于200摄氏度）下制备的薄膜具有非晶结构，而在高衬底温度（高于200摄氏度）下制备的一些薄膜具有多晶结构。通过使用经典模型拟合透过率特性来获得薄膜的光学参数。
