Suppr超能文献

电沉积法选择氧化铜薄膜的形态。

Morphology selection for cupric oxide thin films by electrodeposition.

机构信息

Department of Physics, Alagappa University, Karaikudi 630003, India.

出版信息

Microsc Res Tech. 2011 Oct;74(10):980-3. doi: 10.1002/jemt.20984. Epub 2011 Apr 11.

Abstract

Polycrystalline cupric oxide thin films were deposited using alkaline solution bath employing cathodic electrodeposition method. The thin films were electrodeposited at various solution pH. The surface morphology and elemental analyzes of the films were studied using scanning electron microscopy (SEM) and energy dispersive X-ray analysis, respectively. SEM studies revealed that the surface morphology could be tailored suitably by adjusting the pH value during deposition. Mesh average on multiple lattice mode atomic force microscopy image was obtained and reported.

摘要

多晶氧化铜薄膜采用碱性溶液浴通过阴极电沉积方法进行沉积。薄膜在不同的溶液 pH 值下进行电沉积。使用扫描电子显微镜 (SEM) 和能量色散 X 射线分析分别研究了薄膜的表面形貌和元素分析。SEM 研究表明,通过在沉积过程中调整 pH 值,可以适当地调整表面形貌。还获得并报告了多个晶格模式原子力显微镜图像的网格平均。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验