Department of Physics, University of California Berkeley, Berkeley, California 94720, United States.
Nano Lett. 2011 Jun 8;11(6):2291-5. doi: 10.1021/nl2005115. Epub 2011 May 9.
The use of boron nitride (BN) as a substrate for graphene nanodevices has attracted much interest since the recent report that BN greatly improves the mobility of charge carriers in graphene compared to standard SiO(2) substrates. We have explored the local microscopic properties of graphene on a BN substrate using scanning tunneling microscopy. We find that BN substrates result in extraordinarily flat graphene layers that display microscopic Moiré patterns arising from the relative orientation of the graphene and BN lattices. Gate-dependent dI/dV spectra of graphene on BN exhibit spectroscopic features that are sharper than those obtained for graphene on SiO(2). We observe a significant reduction in local microscopic charge inhomogeneity for graphene on BN compared to graphene on SiO(2).
氮化硼 (BN) 作为石墨烯纳米器件的衬底引起了广泛关注,因为最近的研究报告表明,与标准的 SiO(2) 衬底相比,BN 极大地提高了石墨烯中电荷载流子的迁移率。我们使用扫描隧道显微镜研究了 BN 衬底上石墨烯的局部微观性质。我们发现 BN 衬底导致石墨烯层非常平坦,并显示出源自石墨烯和 BN 晶格相对取向的微观莫尔图案。在 BN 上的石墨烯的栅极依赖的 dI/dV 光谱显示出比在 SiO(2) 上获得的光谱特征更尖锐。与在 SiO(2) 上的石墨烯相比,我们观察到在 BN 上的石墨烯的局部微观电荷非均匀性显著降低。