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Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography.

作者信息

Yu Anguang, Liu Heping, Blinco James P, Jack Kevin S, Leeson Michael, Younkin Todd R, Whittaker Andrew K, Blakey Idriss

机构信息

The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia.

出版信息

Macromol Rapid Commun. 2010 Aug 17;31(16):1449-55. doi: 10.1002/marc.201000117. Epub 2010 Jun 30.

DOI:10.1002/marc.201000117
PMID:21567550
Abstract

A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular-weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist-developer interactions for maximizing image quality has been demonstrated.

摘要

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