Max Planck Institute of Microstructure Physics, Halle, Germany.
Nanotechnology. 2011 Jul 1;22(26):265303. doi: 10.1088/0957-4484/22/26/265303. Epub 2011 May 17.
We studied a suitable route to fabricate ferroelectric islands by focused-ion-beam milling in bismuth ferrite epitaxial thin films. Piezoresponse force microscopy shows that the damage induced by the milling process is extended to 1 µm away from the edge of the focused-ion-beam patterned islands. After a combined vacuum and oxygen atmosphere annealing procedure, ferroelectricity is fully recovered in structures with sizes down to 500 nm, while for 250 nm islands the defects at the interfaces induce polarization direction pinning.
我们研究了通过聚焦离子束铣削在铁酸铋外延薄膜中制造铁电岛的合适途径。压电力显微镜显示,铣削过程引起的损伤扩展到聚焦离子束图案化岛边缘以外 1 µm 的距离。经过真空和氧气气氛退火处理后,尺寸降至 500nm 的结构中完全恢复了铁电性,而对于 250nm 的岛,界面处的缺陷导致极化方向钉扎。