Spott Alexander, Baehr-Jones Tom, Ding Ran, Liu Yang, Bojko Richard, O'Malley Trevor, Pomerene Andrew, Hill Craig, Reinhardt Wesley, Hochberg Michael
Department of Electrical Engineering, University of Washington, Campus Box 352500, Seattle, Washington 98195, USA.
Opt Express. 2011 May 23;19(11):10950-8. doi: 10.1364/OE.19.010950.
We demonstrate low-loss asymmetric slot waveguides in silicon-on-insulator (SOI). 130 and 180 nm wide slots were fabricated with a 248 nm stepper, in 200 nm thick silicon. An asymmetric waveguide design is shown to expand the range in which the TE0 mode is guided and suppress the TE1 mode, while still maintaining a sharp concentration of electric field in the center of the slot. Optical propagation losses of 2 dB/cm or less are shown for asymmetric slot waveguides with 130 nm wide slots and 320 and 100 nm wide arms.
我们展示了绝缘体上硅(SOI)中的低损耗非对称狭缝波导。使用248纳米步进光刻机在200纳米厚的硅中制作了宽度为130和180纳米的狭缝。一种非对称波导设计被证明可以扩大TE0模式的导波范围并抑制TE1模式,同时仍能在狭缝中心保持电场的高度集中。对于具有130纳米宽狭缝以及320和100纳米宽臂的非对称狭缝波导,展示出了2分贝/厘米或更低的光传播损耗。