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硅纳米线的导电探针原子力显微镜表征

Conductive-probe atomic force microscopy characterization of silicon nanowire.

作者信息

Alvarez José, Ngo Irène, Gueunier-Farret Marie-Estelle, Kleider Jean-Paul, Yu Linwei, Cabarrocas Pere Rocai, Perraud Simon, Rouvière Emmanuelle, Celle Caroline, Mouchet Céline, Simonato Jean-Pierre

机构信息

Laboratoire de Génie Electrique de Paris, CNRS UMR 8507, SUPELEC, Univ P-Sud, UPMC Univ Paris 6, 11 rue Joliot-Curie, Plateau de Moulon, 91192 Gif-sur-Yvette Cedex, France.

出版信息

Nanoscale Res Lett. 2011 Jan 31;6(1):110. doi: 10.1186/1556-276X-6-110.

Abstract

The electrical conduction properties of lateral and vertical silicon nanowires (SiNWs) were investigated using a conductive-probe atomic force microscopy (AFM). Horizontal SiNWs, which were synthesized by the in-plane solid-liquid-solid technique, are randomly deployed into an undoped hydrogenated amorphous silicon layer. Local current mapping shows that the wires have internal microstructures. The local current-voltage measurements on these horizontal wires reveal a power law behavior indicating several transport regimes based on space-charge limited conduction which can be assisted by traps in the high-bias regime (> 1 V). Vertical phosphorus-doped SiNWs were grown by chemical vapor deposition using a gold catalyst-driving vapor-liquid-solid process on higly n-type silicon substrates. The effect of phosphorus doping on the local contact resistance between the AFM tip and the SiNW was put in evidence, and the SiNWs resistivity was estimated.

摘要

利用导电探针原子力显微镜(AFM)研究了横向和纵向硅纳米线(SiNWs)的导电特性。通过面内固液固技术合成的水平SiNWs随机分布在未掺杂的氢化非晶硅层中。局部电流映射表明这些线具有内部微观结构。对这些水平线进行的局部电流-电压测量揭示了一种幂律行为,表明基于空间电荷限制传导存在几种传输机制,在高偏压状态(>1 V)下陷阱可能会起到辅助作用。垂直磷掺杂的SiNWs是在高n型硅衬底上通过化学气相沉积,采用金催化剂驱动的气液固工艺生长的。研究证实了磷掺杂对AFM探针与SiNW之间局部接触电阻的影响,并估算了SiNWs的电阻率。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/752b/3211155/3c792678d249/1556-276X-6-110-1.jpg

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