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硅纳米片及其他硅纳米材料的合成与修饰。

Synthesis and modification of silicon nanosheets and other silicon nanomaterials.

机构信息

Organic Material Laboratory, Toyota Central R&D Laboratories, Inc. Nagakute, Aichi, 480-1192, Japan.

出版信息

Chemistry. 2011 Aug 29;17(36):9864-87. doi: 10.1002/chem.201100641. Epub 2011 Jul 20.

DOI:10.1002/chem.201100641
PMID:21780200
Abstract

Silicon nanomaterials and nanostructures exhibit different properties from those of bulk silicon materials based on quantum confinement effects. They are expected to lead to the development of new applications of silicon, in addition to wide use in semiconductor devices. Aside from industrial interest, intriguing issues of academic interest still remain with respect to the origins of their characteristic properties. Zero- and one-dimensional crystalline silicon nanomaterials have been synthesized, to date, by using many methods and there has been rapid progress in size control and modification procedures. However, there have been only a few examples of silicon nanomaterials with atomic-order thickness akin to carbon nanomaterials, such as two-dimensional silicon nanosheets. Moreover, mass production of silicon nanomaterials with relatively low cost is not easily achievable, due to the typically severe conditions required for fabrication, such as high temperature and ultralow pressure. Recently, we have developed a soft synthetic method for silicon nanosheets with chemical surface modification in a solution process. This review provides methods for the synthesis and modification of silicon nanosheets and other silicon nanomaterials with examples of their potential applications.

摘要

基于量子限域效应,硅纳米材料和纳米结构表现出与体硅材料不同的性质。它们有望除了在半导体器件中有广泛应用外,还能为硅的新应用开辟道路。除了工业上的兴趣,硅的特征性质的起源仍然存在一些有趣的学术问题。迄今为止,已经通过多种方法合成了零维和一维晶态硅纳米材料,并且在尺寸控制和修饰程序方面取得了快速进展。然而,仅有少数类似于碳纳米材料(如二维硅纳米片)的原子级厚度的硅纳米材料的例子。此外,由于制造所需的通常苛刻的条件,例如高温和超低压,硅纳米材料的大规模生产且成本相对较低并不容易实现。最近,我们在溶液过程中开发了一种具有化学表面修饰的硅纳米片的软合成方法。本文综述了硅纳米片及其他硅纳米材料的合成和修饰方法,并举例说明了它们的潜在应用。

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