Wang Rong, Pi Xiaodong, Ni Zhenyi, Liu Yong, Lin Shisheng, Xu Mingsheng, Yang Deren
State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
State Key Laboratory of Modern Optical Instrumentation and Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China.
Sci Rep. 2013 Dec 16;3:3507. doi: 10.1038/srep03507.
Understanding the oxidation of silicon has been critical to the success of all types of silicon materials, which are the cornerstones of modern silicon technologies. For the recent experimentally obtained two-dimensional silicene, oxidation should also be addressed to enable the development of silicene-based devices. Here we focus on silicene oxides (SOs) that result from the partial or full oxidation of silicene in the framework of density functional theory. It is found that the formation of SOs greatly depends on oxidation conditions, which concern the oxidizing agents of oxygen and hydroxyl. The honeycomb lattice of silicene may be preserved, distorted or destroyed after oxidation. The charge state of Si in partially oxidized silicene ranges from +1 to +3, while that in fully oxidized silicene is +4. Metals, semimetals, semiconductors and insulators can all be found among the SOs, which show a wide spectrum of electronic structures. Our work indicates that the oxidation of silicene should be exquisitely controlled to obtain specific SOs with desired electronic properties.
了解硅的氧化对于各类硅材料的成功至关重要,而硅材料是现代硅技术的基石。对于最近通过实验获得的二维硅烯,也需要研究其氧化问题,以便开发基于硅烯的器件。在此,我们在密度泛函理论框架下关注硅烯氧化物(SOs),其由硅烯的部分或完全氧化产生。研究发现,SOs的形成很大程度上取决于氧化条件,这涉及氧气和羟基等氧化剂。硅烯的蜂窝晶格在氧化后可能会保留、扭曲或破坏。部分氧化的硅烯中Si的电荷态范围为 +1 到 +3,而完全氧化的硅烯中Si的电荷态为 +4。在SOs中可以发现金属、半金属、半导体和绝缘体,它们展现出广泛的电子结构。我们的工作表明,应精确控制硅烯的氧化,以获得具有所需电子特性的特定SOs。