Department of Physics, University of West Bohemia, Univerzitní 22, Pilsen, 306 14, Czech Republic.
Nanoscale Res Lett. 2007 Feb 27;2(3):123-9. doi: 10.1007/s11671-007-9042-z.
The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2thin films using dc dual magnetron (DM) sputtering in Ar + O2mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature Tsurfmeasured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency frwas investigated in detail. It was found that the increase of frfrom 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate aDof sputtered TiO2films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO2films can be sputtered on unheated glass substrates at aD = 80 nm/min, Tsurf < 180 °C when high value of fr = 350 kHz was used. Properties of a thin hydrophilic TiO2film deposited on a polycarbonate substrate are given.
本文报道了在未加热的玻璃衬底上，采用直流双磁控（DM）溅射在 Ar+O2 混合气体中低温高速溅射亲水透明 TiO2 薄膜。DM 以双极不对称模式运行，并配备了直径为 50 毫米的 Ti（99.5）靶材。通过热条测量的衬底表面温度 Tsurf 在所有实验中都低于 180°C。详细研究了重复频率 fr 的影响。结果发现，fr 从 100 增加到 350 kHz 会导致：（a）沉积过程效率的提高，从而导致溅射 TiO2 薄膜的沉积速率 aD 显著增加；（b）峰值脉冲电压降低，并在更高的靶功率密度下维持磁控放电。结果表明，当使用高 fr = 350 kHz 时，可以在 Tsurf < 180°C 的未加热玻璃衬底上以 aD = 80nm/min 的速率溅射数百纳米厚的亲水 TiO2 薄膜。给出了沉积在聚碳酸酯衬底上的薄亲水 TiO2 薄膜的性能。
