Kim Ho-Cheol, Rettner Charles T, Sundström Linnea
Nanotechnology. 2008 Jun 11;19(23):235301. doi: 10.1088/0957-4484/19/23/235301. Epub 2008 May 6.
The evolution of the scaling of modern semiconductor devices is governed by the ability to create scalable high-resolution patterns on substrates. Since it is becoming increasingly difficult and expensive to extend to smaller dimensions using optical lithography, there is a great deal of interest in alternative patterning methods. The self-assembly of block copolymers in thin films, which provides periodic patterns of 10-50 nm length scales, has been recognized as a promising candidate for such patterning. To be practical, however, this approach must provide control over the orientation and lateral placement of the microdomains. We report here our discovery of the controlled alignment of the lamellar microdomains of a block copolymer containing hybrid material using topographic pre-patterns on substrates. We find that this hybrid material forms lamellae with a half-pitch of approximately 20 nm perpendicular to the lines of a surface corrugation.
现代半导体器件的尺寸缩放演进取决于在衬底上创建可扩展高分辨率图案的能力。由于使用光学光刻技术扩展到更小尺寸变得越来越困难且成本高昂，人们对替代图案化方法产生了浓厚兴趣。薄膜中嵌段共聚物的自组装可提供长度尺度为10 - 50纳米的周期性图案，已被认为是这种图案化的一个有前景的候选方法。然而，要实际应用，这种方法必须能够控制微区的取向和横向排列。我们在此报告，通过在衬底上使用形貌预图案，我们发现了一种含杂化材料的嵌段共聚物的层状微区的可控排列。我们发现这种杂化材料形成的片层垂直于表面波纹线，半间距约为20纳米。
