Inorganic Materials Science, MESA+ Institute for Nanotechnology, University of Twente, P. O. Box 217, 7500 AE Enschede, The Netherlands.
ACS Appl Mater Interfaces. 2011 Sep;3(9):3666-72. doi: 10.1021/am200852w. Epub 2011 Aug 24.
A cost-effective and versatile methodology for bottom-up patterned growth of inorganic and metallic materials on the micro- and nanoscale is presented. Pulsed electrodeposition was employed to deposit arbitrary patterns of Ni, ZnO, and FeO(OH) of high quality, with lateral feature sizes down to 200-290 nm. The pattern was defined by an oxygen plasma-treated patterned PDMS mold in conformal contact with a conducting substrate and immersed in an electrolyte solution, so that the solid phases were deposited from the solution in the channels of the patterned mold. It is important that the distance between the entrance of the channels, and the location where deposition is needed, is kept limited. The as-formed patterns were characterized by high resolution scanning electron microscope, energy-dispersive X-ray analysis, atomic force microscopy, and X-ray diffraction.
本文提出了一种在微纳尺度上实现无机和金属材料自下而上图案化生长的经济高效、通用的方法。采用脉冲电镀的方法，成功地沉积出高质量的 Ni、ZnO 和 FeO(OH) 任意图案，其横向特征尺寸低至 200-290nm。该图案是通过与导电基底紧密接触的经过氧等离子体处理的图案化 PDMS 模具来定义的，模具被浸入电解质溶液中，使得固体相从溶液中在图案化模具的通道中沉积出来。重要的是，要将通道的入口和需要沉积的位置之间的距离保持在有限的范围内。所形成的图案通过高分辨率扫描电子显微镜、能谱分析、原子力显微镜和 X 射线衍射进行了表征。
