Inorganic Materials Science Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
Langmuir. 2011 Oct 4;27(19):12235-42. doi: 10.1021/la2013667. Epub 2011 Sep 1.
A simple and cost-effective methodology for large-area micrometer-scale patterning of a wide range of metallic and oxidic functional materials is presented. Self-assembled monolayers (SAM) of alkyl thiols on Au were micropatterned by channel-diffused oxygen plasma etching, a method in which selected areas of SAM were protected from plasma oxidation via a soft lithographic stamp. The patterned SAMs were used as templates for site-selective electrodeposition, electroless deposition and solution-phase deposition of functional materials such as ZnO, Ni, Ag thin films, and ZnO nanowires. The patterned SAMs and functional materials were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and tunneling AFM (TUNA).
提出了一种简单且经济高效的大面积微尺度图案化方法，可用于多种金属和氧化功能材料。通过通道扩散氧等离子体刻蚀对金上的烷基硫醇自组装单层（SAM）进行微图案化，该方法通过软光刻印章保护 SAM 的选定区域免受等离子体氧化。图案化的 SAM 用作功能材料的选择性电沉积、化学镀和溶液相沉积的模板，例如 ZnO、Ni、Ag 薄膜和 ZnO 纳米线。通过扫描电子显微镜 (SEM)、X 射线衍射 (XRD)、原子力显微镜 (AFM) 和隧道原子力显微镜 (TUNA) 对图案化的 SAM 和功能材料进行了表征。
