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CaCuP薄膜中高迁移率和简并p型导电性的预测与实现

Prediction and realisation of high mobility and degenerate p-type conductivity in CaCuP thin films.

作者信息

Willis Joe, Bravić Ivona, Schnepf Rekha R, Heinselman Karen N, Monserrat Bartomeu, Unold Thomas, Zakutayev Andriy, Scanlon David O, Crovetto Andrea

机构信息

Department of Chemistry, University College London 20 Gordon Street London WC1H 0AJ UK

Thomas Young Centre, University College London Gower Street London WC1E 6BT UK.

出版信息

Chem Sci. 2022 Apr 26;13(20):5872-5883. doi: 10.1039/d2sc01538b. eCollection 2022 May 25.

Abstract

Phosphides are interesting candidates for hole transport materials and p-type transparent conducting applications, capable of achieving greater valence band dispersion than their oxide counterparts due to the higher lying energy and increased size of the P 3p orbital. After computational identification of the indirect-gap semiconductor CaCuP as a promising candidate, we now report reactive sputter deposition of phase-pure p-type CaCuP thin films. Their intrinsic hole concentration and hole mobility exceed 1 × 10 cm and 35 cm V s at room temperature, respectively. Transport calculations indicate potential for even higher mobilities. Copper vacancies are identified as the main source of conductivity, displaying markedly different behaviour compared to typical p-type transparent conductors, leading to improved electronic properties. The optical transparency of CaCuP films is lower than expected from first principles calculations of phonon-mediated indirect transitions. This discrepancy could be partly attributed to crystalline imperfections within the films, increasing the strength of indirect transitions. We determine the transparent conductor figure of merit of CaCuP films as a function of composition, revealing links between stoichiometry, crystalline quality, and opto-electronic properties. These findings provide a promising initial assessment of the viability of CaCuP as a p-type transparent contact.

摘要

磷化物是空穴传输材料和p型透明导电应用的有趣候选材料,由于P 3p轨道能量较高且尺寸增大,它们能够比氧化物对应物实现更大的价带色散。在通过计算确定间接带隙半导体CaCuP是一种有前途的候选材料后,我们现在报告了相纯p型CaCuP薄膜的反应溅射沉积。它们在室温下的本征空穴浓度和空穴迁移率分别超过1×10 cm和35 cm V s。输运计算表明有实现更高迁移率的潜力。铜空位被确定为电导率的主要来源,与典型的p型透明导体相比,表现出明显不同的行为,从而改善了电子性能。CaCuP薄膜的光学透明度低于声子介导的间接跃迁的第一性原理计算预期。这种差异部分可归因于薄膜内的晶体缺陷,增加了间接跃迁的强度。我们确定了CaCuP薄膜的透明导体品质因数与成分的函数关系,揭示了化学计量、晶体质量和光电性能之间的联系。这些发现为CaCuP作为p型透明接触的可行性提供了有希望的初步评估。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a83f/9132065/ffece4d4986e/d2sc01538b-f1.jpg

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