Materials Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London, WC1H 0AJ, UK.
Chemistry. 2011 Oct 4;17(41):11613-21. doi: 10.1002/chem.201100399. Epub 2011 Sep 1.
The use of an aerosol delivery system enabled fluorine-doped tin dioxide films to be formed from monobutyltin trichloride methanolic solutions at 350-550 °C with enhanced functional properties compared with commercial standards. It was noted that small aerosol droplets (0.3 μm) gave films with better figures of merit than larger aerosol droplets (45 μm) or use of a similar precursor set using atmospheric pressure chemical vapour deposition (CVD) conditions. Control over the surface texturing and physical properties of the thin films were investigated by variation in the deposition temperature and dopant concentration. Optimum deposition conditions for low-emissivity coatings were found to be at a substrate temperature of about 450 °C with a dopant concentration of 1.6 atm% (30 mol% F:Sn in solution), which resulted in films with a low visible light haze value (1.74%), a high charge-carrier mobility (25 cm(2) V s(-1)) and a high charge-carrier density (5.7×10(20) cm(-3)) resulting in a high transmittance across the visible (≈80%), a high reflectance in the IR (80% at 2500 nm) and plasma-edge onset at 1400 nm. Optimum deposition conditions for coatings with applications as top electrodes in thin film photovoltaics were found to be a substrate temperature of about 500 °C with a dopant concentration of 2.2 atm% (30 mol% F:Sn in solution), which resulted in films with a low sheet resistance (3 Ω sq(-1)), high charge-carrier density (6.4×10(20) cm(-3)), a plasma edge onset of 1440 nm and the films also showed pyramidal surface texturing on the micrometer scale which corresponded to a high visible light haze value (8%) for light scattering and trapping within thin film photovoltaic devices.
采用气溶胶输送系统，使掺杂氟的二氧化锡薄膜能够从单丁基三氯化锡甲醇溶液中在 350-550°C 下形成，与商业标准相比具有增强的功能特性。据指出，小的气溶胶液滴（0.3μm）形成的薄膜具有比大的气溶胶液滴（45μm）或使用类似的在常压化学气相沉积（CVD）条件下使用的前体更好的性能。通过改变沉积温度和掺杂浓度来控制薄膜的表面织构和物理性质。发现低发射率涂层的最佳沉积条件为衬底温度约为 450°C，掺杂浓度为 1.6 大气压%（溶液中 30mol%F:Sn），这导致薄膜具有低可见光雾度值（1.74%）、高电荷载流子迁移率（25cm²Vs⁻¹）和高电荷载流子密度（5.7×10²⁰cm⁻³），从而在可见光范围内具有高透过率（≈80%），在红外（80%在 2500nm）和等离子体边缘起始于 1400nm。发现用于薄膜光伏器件顶部电极的涂层的最佳沉积条件为衬底温度约为 500°C，掺杂浓度为 2.2 大气压%（溶液中 30mol%F:Sn），这导致薄膜具有低方阻（3Ωsq⁻¹）、高电荷载流子密度（6.4×10²⁰cm⁻³）、等离子体边缘起始于 1440nm，并且薄膜还显示出在微米尺度上的金字塔形表面织构，这对应于薄膜光伏器件内光散射和捕获的高可见光雾度值（8%）。
