State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, China.
Opt Lett. 2011 Sep 1;36(17):3305-7. doi: 10.1364/OL.36.003305.
Herein, we report a facile approach for rapid and maskless production of subwavelength structured antireflective surfaces with high and broadband transmittance-direct laser interference ablation. The interfered laser beams were introduced into the surface of a bare optical substrate, where structured surfaces consisting of a micropillar array were produced by two-step laser irradiation in the time frame of seconds. A multiple exposure of the two-beam interference approach was proposed instead of multiple-beam interference to simply realize planar patterns of a high aspect ratio. Tall sinusoidal pillars were created and shaped by pulse shot number control. As an example of the application, zinc sulfide substrates were processed with the technology, from which high transmission at an infrared wavelength, over 92%, at normal incidence was experimentally achieved.
在此,我们报告了一种通过直接激光干涉烧蚀快速、无掩模制备具有高透过率和宽带的亚波长结构抗反射表面的简易方法。将干涉激光束引入裸光学基底的表面,通过在几秒钟的时间内进行两步激光辐照,在基底表面产生由微柱阵列组成的结构表面。提出了多次双光束干涉的方法来简单地实现高纵横比的平面图案,而不是多次光束干涉。通过脉冲数量控制来生成和塑造高正弦形立柱。作为应用实例,用该技术对硫化锌基底进行了处理,实验实现了在近红外波长下超过 92%的高透过率,在正入射时。