Bo Zheng, Cui Shumao, Yu Kehan, Lu Ganhua, Mao Shun, Chen Junhong
Department of Mechanical Engineering, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53211, USA.
Rev Sci Instrum. 2011 Aug;82(8):086116. doi: 10.1063/1.3624842.
This note describes a new reactor design for continuous synthesis of vertically oriented graphene (VG) sheets on cylindrical wire substrates using an atmospheric plasma-enhanced chemical vapor deposition (PECVD) system. Through combining a U-shaped reactor design with "dynamic mode" synthesis featuring simultaneous rotational and axial movements of the metallic wire substrate, the new setup can enable continuous synthesis of VG sheets on the wire surface with remarkable uniformity in both circumferential and axial directions. In contrast, synthesis of VG at "static mode" with a fixed substrate can only lead to non-uniform growth of VG sheets on the wire surface. Potential applications of the resulting uniform-VG-coated metallic wire could include field emitters, field-ionization-based neutral atom detectors, and indoor corona discharges.
本笔记描述了一种新型反应器设计,用于在圆柱形金属丝基板上使用常压等离子体增强化学气相沉积(PECVD)系统连续合成垂直取向的石墨烯(VG)片。通过将U形反应器设计与金属丝基板同时进行旋转和轴向运动的“动态模式”合成相结合,这种新装置能够在金属丝表面连续合成VG片,在圆周和轴向方向上均具有显著的均匀性。相比之下,在固定基板的“静态模式”下合成VG只会导致金属丝表面的VG片生长不均匀。所得均匀涂覆VG的金属丝的潜在应用可能包括场发射体、基于场电离的中性原子探测器和室内电晕放电。