Ikeda M, Sugawara A, Harada K
Central Research Laboratory, Hitachi Ltd, Akanuma, Hatoyama, Hiki, Saitama 350-0395, Japan.
J Electron Microsc (Tokyo). 2011 Dec;60(6):353-8. doi: 10.1093/jmicro/dfr071. Epub 2011 Oct 15.
In order to obtain a large deflection angle without increasing the applied voltage to an electron biprism, we have developed a 'twin-electron biprism' (TBP), which is composed of two filament electrodes and a pair of ground plates. The observed interference-fringe spacing revealed that the deflection angle created by a TBP was about twice larger than that by a 'conventional electron biprism'. Also, we have suggested, in a double-electron biprism interferometry, the optimal disposition of a TBP for reducing the intensity of Fresnel fringes recorded in an electron hologram.
为了在不增加施加到电子双棱镜上的电压的情况下获得大偏转角，我们开发了一种“双电子双棱镜”（TBP），它由两个灯丝电极和一对接地板组成。观察到的干涉条纹间距表明，TBP产生的偏转角大约是“传统电子双棱镜”产生的偏转角的两倍。此外，我们还提出了在双电子双棱镜干涉测量中，TBP的最佳布置方式，以降低电子全息图中记录的菲涅耳条纹的强度。
