Melville Laboratory for Polymer Synthesis, Department of Chemistry, University of Cambridge, UK.
Adv Mater. 2011 Dec 1;23(45):5404-8. doi: 10.1002/adma.201103107. Epub 2011 Oct 18.
Electron beam lithography is a powerful technique for the production of nanostructures but pattern quality depends on numerous interacting process variables. Orthogonal gradients of resist composition, baking temperatures, and development time as well as dose variations inside writing fields are used to prepare ternary combinatorial libraries for an efficient stepwise optimization of a molecular glass negative tone resist system.
电子束光刻是一种用于生产纳米结构的强大技术，但图案质量取决于许多相互作用的过程变量。使用正交梯度的抗蚀剂组成、烘焙温度和显影时间以及写入场中的剂量变化，来制备三元组合库，以对分子玻璃负性光刻胶体系进行有效的逐步优化。
