Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
Adv Mater. 2011 Jan 11;23(2):147-79. doi: 10.1002/adma.201001856.
Interferometric lithography (IL) is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium, such as a photoresist, that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with IL are a platform for further fabrication of nanostructures and growth of functional materials and are building blocks for devices. This article provides a brief review of IL technologies and focuses on various applications for nanostructures and functional materials based on IL including directed self-assembly of colloidal nanoparticles, nanophotonics, semiconductor materials growth, and nanofluidic devices. Perspectives on future directions for IL and emerging applications in other fields are presented.
干涉光刻（IL）是一种用于定义大面积、纳米级、周期性图案结构的强大技术。图案记录在光敏感介质中，例如对与两个或多个相干光束的干涉相关的强度分布具有非线性响应的光致抗蚀剂。使用 IL 产生的光致抗蚀剂图案是进一步制造纳米结构和生长功能材料的平台，并且是器件的构建块。本文简要回顾了 IL 技术，并重点介绍了基于 IL 的各种纳米结构和功能材料的应用，包括胶体纳米粒子的定向自组装、纳米光子学、半导体材料生长和纳米流控器件。还提出了 IL 的未来发展方向以及其他领域新兴应用的观点。
