Department of Chemistry, National University of Singapore, 3 Science Drive 3, 117543 Singapore.
ACS Nano. 2011 Dec 27;5(12):9927-33. doi: 10.1021/nn203700w. Epub 2011 Nov 4.
The separation of chemical vapor deposited (CVD) graphene from the metallic catalyst it is grown on, followed by a subsequent transfer to a dielectric substrate, is currently the adopted method for device fabrication. Most transfer techniques use a chemical etching method to dissolve the metal catalysts, thus imposing high material cost in large-scale fabrication. Here, we demonstrate a highly efficient, nondestructive electrochemical route for the delamination of CVD graphene film from metal surfaces. The electrochemically delaminated graphene films are continuous over 95% of the surface and exhibit increasingly better electronic quality after several growth cycles on the reused copper catalyst, due to the suppression of quasi-periodical nanoripples induced by copper step edges. The electrochemical delamination process affords the advantages of high efficiency, low-cost recyclability, and minimal use of etching chemicals.
化学气相沉积（CVD）石墨烯与生长其上的金属催化剂的分离，随后转移到介电基底上，目前是器件制造所采用的方法。大多数转移技术使用化学蚀刻方法来溶解金属催化剂，因此在大规模制造中会造成高昂的材料成本。在这里，我们展示了一种高效、无损的电化学方法，用于从金属表面剥离 CVD 石墨烯薄膜。电化学剥离的石墨烯薄膜在表面上超过 95%的区域是连续的，并且在重复使用的铜催化剂上经过几个生长循环后，由于抑制了铜阶边缘引起的准周期性纳米波纹，其电子质量越来越好。电化学剥离过程具有高效、低成本的可回收性和最小化使用蚀刻化学品的优点。
